photolithography
Differences
This shows you the differences between two versions of the page.
| Both sides previous revision Previous revision | |||
|
photolithography [2023/05/23 11:45] dublin |
photolithography [2024/03/19 14:27] (current) dublin |
||
|---|---|---|---|
| Line 58: | Line 58: | ||
| May 2023: | May 2023: | ||
| - | Development time for LOR: I found that using this recipe, but with 12 second exposure at 6 mJ/cm^2 and 100 seconds development gave a ~0.3 um undercut. - Dublin | + | Development time for LOR: Baking LOR at 180C, 12 second exposure at 6 mJ/cm^2, and 100 seconds development gave a ~0.3 um undercut. - Dublin |
photolithography.txt · Last modified: 2024/03/19 14:27 by dublin
Page Tools
Except where otherwise noted, content on this wiki is licensed under the following license: CC Attribution-Share Alike 4.0 International
