old_photolith_recipes
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| + | === S1813 Recipe comments === | ||
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| + | May 2023: | ||
| + | Development time for LOR: Baking LOR at 180C, 12 second exposure at 6 mJ/cm^2, and 100 seconds development gave a ~0.3 um undercut. - Dublin | ||
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| + | ===SU-8 Photoresist=== | ||
| + | * SU-8 is a polymer-like negative photoresist. | ||
| + | * We use SU-8 in liquid gated GFETs as a passivation layer to protect metal leads from the gate electrolyte. | ||
| + | * Read the SU-8 process guide for SU-8 2002 [[https:// | ||
| + | * [[http:// | ||
| //(updated 04-08-2010)// | //(updated 04-08-2010)// | ||
old_photolith_recipes.txt · Last modified: 2026/08/13 16:00 by gus
