device_making
Differences
This shows you the differences between two versions of the page.
| Both sides previous revisionPrevious revision | |||
| device_making [2022/09/13 11:22] – Moved photolithography to its own page dublin | device_making [2022/09/13 11:23] (current) – dublin | ||
|---|---|---|---|
| Line 20: | Line 20: | ||
| {{:: | {{:: | ||
| All experimental physicists working in this field have to learn [[best practices for handling chips]]. | All experimental physicists working in this field have to learn [[best practices for handling chips]]. | ||
| + | |||
| + | |||
| + | ===== Photolithography ===== | ||
| + | |||
| + | Uses chrome masks to expose photoresist. See [[Photolithography]] | ||
| ===== Mask design ===== | ===== Mask design ===== | ||
device_making.1663093352.txt.gz · Last modified: 2022/09/13 11:22 by dublin