photolithography
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- | Development time for LOR: I found that using this recipe, but with 12 second exposure at 6 mJ/cm^2 and 100 seconds development gave a ~0.3 um undercut. - Dublin | + | Development time for LOR: Baking LOR at 180C, 12 second exposure at 6 mJ/cm^2, and 100 seconds development gave a ~0.3 um undercut. - Dublin |
photolithography.1684867504.txt.gz · Last modified: 2023/05/23 11:45 by dublin