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--- photolithography [2023/05/23 11:44] – dublin
+++ photolithography [2024/03/19 14:27] (current) – dublin
@@ Line 41: / Line 41: @@
 (3)	Carefully insert mask, with purple side facing sample. Add chip and align properly. Exposure time is 10-12 s.
-~~Update Dublin 2022 ECE 418 aligner is no longer in use. The other aligner has less than half the light power, around 6 mW/cm^2, requiring over twice the exposure time (ECE418: 3-4 s. New aligner, 10-12 s.)
+~~Update Dublin 2022: ECE 418 aligner is no longer in use. The other aligner has less than half the light power, around 6 mW/cm^2, requiring over twice the exposure time (ECE418: 3-4 s. New aligner, 10-12 s.)
@@ Line 58: / Line 58: @@
 May 2023:
-Development time for LOR: I found that using this recipe, but with 12 second exposure at 6 mJ/cm^2 and 100 seconds development gave a ~0.3 um undercut. - Dublin
+Development time for LOR: Baking LOR at 180C, 12 second exposure at 6 mJ/cm^2, and 100 seconds development gave a ~0.3 um undercut. - Dublin
 ===SU-8 Photoresist===
-  * SU-8 is a polymer like negative photoresist.
+  * SU-8 is a polymer-like negative photoresist.
   * We use SU-8 in liquid gated GFETs as a passivation layer to protect metal leads from the gate electrolyte.
   * Read the SU-8 process guide for SU-8 2002 [[https://kayakuam.com/wp-content/uploads/2019/09/SU-82000DataSheet2000_5thru2015Ver4-2.pdf|here]].